Charge transport in amorphous chalcogenide-GST used for memory devices is modeled by means of two contributions: hopping of trapped electrons and motion of band electrons. Field-induced emission is accounted for as the mechanism mainly responsible for the trap-to-band transitions. The experimental snap-back behavior of the I(V) curves is reproduced even in the simple case of one-dimensional, uniform structures as the one considered in the paper.

Modeling of the voltage snap-back in amorphous-GST memory devices

RUDAN, MASSIMO;GIOVANARDI, FABIO;TSAFACK TSOPBENG, THIERRY BIENVENU;PICCININI, ENRICO;BUSCEMI, FABRIZIO;
2010

Abstract

Charge transport in amorphous chalcogenide-GST used for memory devices is modeled by means of two contributions: hopping of trapped electrons and motion of band electrons. Field-induced emission is accounted for as the mechanism mainly responsible for the trap-to-band transitions. The experimental snap-back behavior of the I(V) curves is reproduced even in the simple case of one-dimensional, uniform structures as the one considered in the paper.
2010
International Conference on Simulation of Semiconductor Processes and Devices (SISPAD 2010)
257
260
M. Rudan; F. Giovanardi; T. Tsafack; F. Xiong; E. Piccinini; F. Buscemi; A. Liao; E. Pop; R. Brunetti; C. Jacoboni
File in questo prodotto:
Eventuali allegati, non sono esposti

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11585/97514
 Attenzione

Attenzione! I dati visualizzati non sono stati sottoposti a validazione da parte dell'ateneo

Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus 4
  • ???jsp.display-item.citation.isi??? 1
social impact