We report on the implementation of thin atomic layer deposited coatings for environmental protection and reflectivity enhancement of Al-based micromirror devices. The reflectance characteristics of HfO2and SiO2thin layers on Al surfaces has been simulated by Rigorous Coupled-Wave Analysis (RCWA). Reflectance enhancement, especially in the 420–675 nm wavelength region, has been predicted by fine-tuning the layer thickness in HfO2/SiO2dual layer stacks. This engineered solution has been developed and then implemented on real micro-electro-mechanical system (MEMS) devices demonstrating an enhancement of the reflectivity. Our approach suggests that atomic layer deposition is a valid method for both protecting and enhancing the performances of reflective surfaces of micro-opto-electro mechanical systems.

Cianci, E., Lamperti, A., Tallarida, G., Zanuccoli, M., Fiegna, C., Lamagna, L., et al. (2018). Advanced protective coatings for reflectivity enhancement by low temperature atomic layer deposition of HfO2on Al surfaces for micromirror applications. SENSORS AND ACTUATORS. A, PHYSICAL, 282, 124-131 [10.1016/j.sna.2018.09.028].

Advanced protective coatings for reflectivity enhancement by low temperature atomic layer deposition of HfO2on Al surfaces for micromirror applications

Lamperti, A.;Zanuccoli, M.;Fiegna, C.;
2018

Abstract

We report on the implementation of thin atomic layer deposited coatings for environmental protection and reflectivity enhancement of Al-based micromirror devices. The reflectance characteristics of HfO2and SiO2thin layers on Al surfaces has been simulated by Rigorous Coupled-Wave Analysis (RCWA). Reflectance enhancement, especially in the 420–675 nm wavelength region, has been predicted by fine-tuning the layer thickness in HfO2/SiO2dual layer stacks. This engineered solution has been developed and then implemented on real micro-electro-mechanical system (MEMS) devices demonstrating an enhancement of the reflectivity. Our approach suggests that atomic layer deposition is a valid method for both protecting and enhancing the performances of reflective surfaces of micro-opto-electro mechanical systems.
2018
Cianci, E., Lamperti, A., Tallarida, G., Zanuccoli, M., Fiegna, C., Lamagna, L., et al. (2018). Advanced protective coatings for reflectivity enhancement by low temperature atomic layer deposition of HfO2on Al surfaces for micromirror applications. SENSORS AND ACTUATORS. A, PHYSICAL, 282, 124-131 [10.1016/j.sna.2018.09.028].
Cianci, E.*; Lamperti, A.; Tallarida, G.; Zanuccoli, M.; Fiegna, C.; Lamagna, L.; Losa, S.; Rossini, S.; Vercesi, F.; Gatti, D.; Wiemer, C.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11585/644495
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