We report on the implementation of thin atomic layer deposited coatings for environmental protection and reflectivity enhancement of Al-based micromirror devices. The reflectance characteristics of HfO2and SiO2thin layers on Al surfaces has been simulated by Rigorous Coupled-Wave Analysis (RCWA). Reflectance enhancement, especially in the 420–675 nm wavelength region, has been predicted by fine-tuning the layer thickness in HfO2/SiO2dual layer stacks. This engineered solution has been developed and then implemented on real micro-electro-mechanical system (MEMS) devices demonstrating an enhancement of the reflectivity. Our approach suggests that atomic layer deposition is a valid method for both protecting and enhancing the performances of reflective surfaces of micro-opto-electro mechanical systems.
Advanced protective coatings for reflectivity enhancement by low temperature atomic layer deposition of HfO2on Al surfaces for micromirror applications
Lamperti, A.;Zanuccoli, M.;Fiegna, C.;
2018
Abstract
We report on the implementation of thin atomic layer deposited coatings for environmental protection and reflectivity enhancement of Al-based micromirror devices. The reflectance characteristics of HfO2and SiO2thin layers on Al surfaces has been simulated by Rigorous Coupled-Wave Analysis (RCWA). Reflectance enhancement, especially in the 420–675 nm wavelength region, has been predicted by fine-tuning the layer thickness in HfO2/SiO2dual layer stacks. This engineered solution has been developed and then implemented on real micro-electro-mechanical system (MEMS) devices demonstrating an enhancement of the reflectivity. Our approach suggests that atomic layer deposition is a valid method for both protecting and enhancing the performances of reflective surfaces of micro-opto-electro mechanical systems.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
