Presently there is a high interest in silicon-based optical devices that would render possible the development of fully silicon-based optoelectronics. Being an indirect gap semiconductor, silicon is poorly efficient as light emitter since radiative emission is limited by carrier recombination at non-radiative centers. One of the possible approaches to enhance the radiative emission from Si is the controlled introduction of micro- (dislocations) or nano- (nanocrystals) structures, which, providing quantum confinement of free carriers, prevent their diffusion towards non-radiative channels. Dislocations introduced in silicon by plastic deformation and Si nanocrystals embedded in amorphous silicon matrix have been investigated by junction spectroscopy and scanning probe microscopy methods.

Micro- and nano-structures in silicon studied by DLTS and scanning probe methods / D.Cavalcoli; A.Cavallini; M.Rossi; S.Pizzini. - In: SEMICONDUCTORS. - ISSN 1063-7826. - ELETTRONICO. - 41:4(2006), pp. 435-440. (Intervento presentato al convegno 8th International Workshop on Beam Injection Assessment of Microstructures in Semiconductors tenutosi a St Petersburg, RUSSIA nel JUN 11-14, 2006) [10.1134/S1063782607040112].

Micro- and nano-structures in silicon studied by DLTS and scanning probe methods

CAVALCOLI, DANIELA;CAVALLINI, ANNA;ROSSI, MARCO
2006

Abstract

Presently there is a high interest in silicon-based optical devices that would render possible the development of fully silicon-based optoelectronics. Being an indirect gap semiconductor, silicon is poorly efficient as light emitter since radiative emission is limited by carrier recombination at non-radiative centers. One of the possible approaches to enhance the radiative emission from Si is the controlled introduction of micro- (dislocations) or nano- (nanocrystals) structures, which, providing quantum confinement of free carriers, prevent their diffusion towards non-radiative channels. Dislocations introduced in silicon by plastic deformation and Si nanocrystals embedded in amorphous silicon matrix have been investigated by junction spectroscopy and scanning probe microscopy methods.
2006
Proceedings of BIAMS 2006The 8th International Workshop on Beam Injection Assessment of Microstructures in Semiconductors
435
440
Micro- and nano-structures in silicon studied by DLTS and scanning probe methods / D.Cavalcoli; A.Cavallini; M.Rossi; S.Pizzini. - In: SEMICONDUCTORS. - ISSN 1063-7826. - ELETTRONICO. - 41:4(2006), pp. 435-440. (Intervento presentato al convegno 8th International Workshop on Beam Injection Assessment of Microstructures in Semiconductors tenutosi a St Petersburg, RUSSIA nel JUN 11-14, 2006) [10.1134/S1063782607040112].
D.Cavalcoli; A.Cavallini; M.Rossi; S.Pizzini
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11585/42965
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