Dry film photoresist is used for creating microfluidic structures by sandwiching the patterned resist in between of two substrates. The technique is applied for creating hybrid biochips for dielectrophoretic cell manipulation. Multiple level lithography is demonstrated and biocompatibility of the resist is proven. Due to simple fabrication procedures the resist can be processed in a lowtech environment.
Dry Film resist for Fast Fluidic Prototyping / P. Vulto; N. Glade; L. Altomare; J. Bablet; G. Medoro; A. Leonardi; A. Romani; I. Chartier; N. Manaresi; M. Tartagni; R. Guerrieri. - STAMPA. - (2004), pp. 43-45. (Intervento presentato al convegno Conference Micro-TAS 2004 tenutosi a Malmo (Sweden) nel 26-30 September 2004).
Dry Film resist for Fast Fluidic Prototyping
ALTOMARE, LUIGI;MEDORO, GIANNI;LEONARDI, ANDREA;ROMANI, ALDO;MANARESI, NICOLO';TARTAGNI, MARCO;GUERRIERI, ROBERTO
2004
Abstract
Dry film photoresist is used for creating microfluidic structures by sandwiching the patterned resist in between of two substrates. The technique is applied for creating hybrid biochips for dielectrophoretic cell manipulation. Multiple level lithography is demonstrated and biocompatibility of the resist is proven. Due to simple fabrication procedures the resist can be processed in a lowtech environment.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
