High Fe concentrations (up to 2 × 1019 cm-3) have been implanted in n-doped InP to compensate the substrate donors. The resulting semi-insulating layers have been investigated by current-voltage (I-V) measurements and photo-induced current transient spectroscopy (PICTS) analyses to characterise the Fe activation process and to study the Fe related deep levels. The activation of the Fe2+/3+ trap has been assessed by the identification of the deep level located at EC - 0.64 eV. The outcomes of the PICTS measurements have been correlated with the electrically active Fe concentration calculated from a numerical simulation of the I-V characteristics. We observe an increasing linear relation between the electrically active Fe concentration and the substrate doping density, with a maximum active Fe concentration as high as 2 × 1018 cm-3, i.e. more than an order of magnitude above the equilibrium Fe solid solubility. These data are presented and their implications discussed.

Fraboni, B., Gasparotto, A., Priolo, F., Scamarcio, G. (2001). High Fe2+/3+ trap concentration in heavily compensated implanted InP. APPLIED PHYSICS. A, MATERIALS SCIENCE & PROCESSING, 73(1), 35-38 [10.1007/s003390100864].

High Fe2+/3+ trap concentration in heavily compensated implanted InP

Fraboni B.;
2001

Abstract

High Fe concentrations (up to 2 × 1019 cm-3) have been implanted in n-doped InP to compensate the substrate donors. The resulting semi-insulating layers have been investigated by current-voltage (I-V) measurements and photo-induced current transient spectroscopy (PICTS) analyses to characterise the Fe activation process and to study the Fe related deep levels. The activation of the Fe2+/3+ trap has been assessed by the identification of the deep level located at EC - 0.64 eV. The outcomes of the PICTS measurements have been correlated with the electrically active Fe concentration calculated from a numerical simulation of the I-V characteristics. We observe an increasing linear relation between the electrically active Fe concentration and the substrate doping density, with a maximum active Fe concentration as high as 2 × 1018 cm-3, i.e. more than an order of magnitude above the equilibrium Fe solid solubility. These data are presented and their implications discussed.
2001
Fraboni, B., Gasparotto, A., Priolo, F., Scamarcio, G. (2001). High Fe2+/3+ trap concentration in heavily compensated implanted InP. APPLIED PHYSICS. A, MATERIALS SCIENCE & PROCESSING, 73(1), 35-38 [10.1007/s003390100864].
Fraboni, B.; Gasparotto, A.; Priolo, F.; Scamarcio, G.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11585/1001713
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