A new type of plasma x-ray source has been developed by applying the spherical pinch concept of imploding shock waves to produce a dense plasma hot enough to emit soft x-rays. Very intense x-rays in a few keV energy (5-10 angstroms) is radiated from a small plasma volume as microsecond pulses. SPX II is a prototype machine designed to demonstrate the engineering feasibility of the spherical pinch scheme. It is expected to generate at least 10 mJ/cm2 of usable soft x-rays for microlithography.

Kawai K., Panarella Emilio, Mostacci D. (1991). Spherical pinch x-ray generator prototype for microlithography. Bellingham : Publ by Int Soc for Optical Engineering [10.1117/12.47366].

Spherical pinch x-ray generator prototype for microlithography

Mostacci D.
1991

Abstract

A new type of plasma x-ray source has been developed by applying the spherical pinch concept of imploding shock waves to produce a dense plasma hot enough to emit soft x-rays. Very intense x-rays in a few keV energy (5-10 angstroms) is radiated from a small plasma volume as microsecond pulses. SPX II is a prototype machine designed to demonstrate the engineering feasibility of the spherical pinch scheme. It is expected to generate at least 10 mJ/cm2 of usable soft x-rays for microlithography.
1991
Proc. SPIE 1465, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing
308
314
Kawai K., Panarella Emilio, Mostacci D. (1991). Spherical pinch x-ray generator prototype for microlithography. Bellingham : Publ by Int Soc for Optical Engineering [10.1117/12.47366].
Kawai K.; Panarella Emilio; Mostacci D.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11585/913087
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