A new type of plasma x-ray source has been developed by applying the spherical pinch concept of imploding shock waves to produce a dense plasma hot enough to emit soft x-rays. Very intense x-rays in a few keV energy (5-10 angstroms) is radiated from a small plasma volume as microsecond pulses. SPX II is a prototype machine designed to demonstrate the engineering feasibility of the spherical pinch scheme. It is expected to generate at least 10 mJ/cm2 of usable soft x-rays for microlithography.
Spherical pinch x-ray generator prototype for microlithography / Kawai K.; Panarella Emilio; Mostacci D.. - CD-ROM. - 1465:(1991), pp. 308-314. (Intervento presentato al convegno Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing tenutosi a San Jose, CA, USA, nel 01/08/1991) [10.1117/12.47366].
Spherical pinch x-ray generator prototype for microlithography
Mostacci D.
1991
Abstract
A new type of plasma x-ray source has been developed by applying the spherical pinch concept of imploding shock waves to produce a dense plasma hot enough to emit soft x-rays. Very intense x-rays in a few keV energy (5-10 angstroms) is radiated from a small plasma volume as microsecond pulses. SPX II is a prototype machine designed to demonstrate the engineering feasibility of the spherical pinch scheme. It is expected to generate at least 10 mJ/cm2 of usable soft x-rays for microlithography.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
