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EnglishPhotonic Wire Bragg Gratings fabricated in Silicon-on-Insulator are obtained by periodic insertion of lateral recess into a photonic wire waveguide. Thanks to the high index contrast between silicon and air, they can potentially achieve large reflectivity within few tens of microns. To enable their practical use, taper stages are needed to enhance the coupling with the input and output photonic wires. In this paper, we verify that such gratings can be fabricated with controlled and reproducible dimensions and we demonstrate design curves that can be used for the fine tuning of taper elements.
| Titolo: | Progetto di reticoli Photonic Wire | |
| Autore/i: | GNAN, MARCO; M. Sorel; R. M. De La Rue; G. Bellanca; BASSI, PAOLO | |
| Autore/i Unibo: | ||
| Anno: | 2008 | |
| Titolo del libro: | Atti della XVII Riunione Nazionale di Elettomagnetismo (XVII RiNEm) | |
| Abstract: | Photonic Wire Bragg Gratings fabricated in Silicon-on-Insulator are obtained by periodic insertion of lateral recess into a photonic wire waveguide. Thanks to the high index contrast between silicon and air, they can potentially achieve large reflectivity within few tens of microns. To enable their practical use, taper stages are needed to enhance the coupling with the input and output photonic wires. In this paper, we verify that such gratings can be fabricated with controlled and reproducible dimensions and we demonstrate design curves that can be used for the fine tuning of taper elements. | |
| Data prodotto definitivo in UGOV: | 26-nov-2008 | |
| Appare nelle tipologie: | 4.01 Contributo in Atti di convegno |
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