Photonic Wire Bragg Gratings fabricated in Silicon-on-Insulator are obtained by periodic insertion of lateral recess into a photonic wire waveguide. Thanks to the high index contrast between silicon and air, they can potentially achieve large reflectivity within few tens of microns. To enable their practical use, taper stages are needed to enhance the coupling with the input and output photonic wires. In this paper, we verify that such gratings can be fabricated with controlled and reproducible dimensions and we demonstrate design curves that can be used for the fine tuning of taper elements.

Progetto di reticoli Photonic Wire

GNAN, MARCO;BASSI, PAOLO
2008

Abstract

Photonic Wire Bragg Gratings fabricated in Silicon-on-Insulator are obtained by periodic insertion of lateral recess into a photonic wire waveguide. Thanks to the high index contrast between silicon and air, they can potentially achieve large reflectivity within few tens of microns. To enable their practical use, taper stages are needed to enhance the coupling with the input and output photonic wires. In this paper, we verify that such gratings can be fabricated with controlled and reproducible dimensions and we demonstrate design curves that can be used for the fine tuning of taper elements.
Atti della XVII Riunione Nazionale di Elettomagnetismo (XVII RiNEm)
M. Gnan; M. Sorel; R. M. De La Rue; G. Bellanca; P. Bassi
File in questo prodotto:
Eventuali allegati, non sono esposti

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: http://hdl.handle.net/11585/65322
 Attenzione

Attenzione! I dati visualizzati non sono stati sottoposti a validazione da parte dell'ateneo

Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus ND
  • ???jsp.display-item.citation.isi??? ND
social impact