The co-deposition of PdO particles with a Cu matrix has been investigated with the aim of extending the composite deposition procedure to the preparation of materials potentially capable of catalyzing the low-temperature combustion of methane and other low hydrocarbons. Cu+PdO composites with a low dispersed phase content were obtained from either basic pyrophosphate or acid sulfate baths. PdO incorporation in Cu-Pd alloy matrices was much more effective than incorporation in Cu matrices, yielding deposits with 20-25 Pd at %, even when the Pd content of the alloys was as low as 1-2 at %. (Cu-Pd)+PdO composites were highly porous and mechanically stable. ©The Electrochemical Society.

Electrodeposition of Cu+PdO and (Cu-Pd)+PdO composites / Verlato, Enrico*; Cattarin, Sandro; Comisso, Nicola; Gerbasi, Rosalba; Guerriero, Paolo; Musiani, Marco; Vázquez-Gómez, Lourdes. - In: ECS TRANSACTIONS. - ISSN 1938-5862. - ELETTRONICO. - 25:27(2010), pp. 53-68. (Intervento presentato al convegno Semiconductors, Metal Oxides, and Composites: Metallization and Electrodeposition of Thin Films and Nanostructures - 216th ECS Meeting tenutosi a Vienna, aut nel 2009) [10.1149/1.3318504].

Electrodeposition of Cu+PdO and (Cu-Pd)+PdO composites

Verlato, Enrico;
2010

Abstract

The co-deposition of PdO particles with a Cu matrix has been investigated with the aim of extending the composite deposition procedure to the preparation of materials potentially capable of catalyzing the low-temperature combustion of methane and other low hydrocarbons. Cu+PdO composites with a low dispersed phase content were obtained from either basic pyrophosphate or acid sulfate baths. PdO incorporation in Cu-Pd alloy matrices was much more effective than incorporation in Cu matrices, yielding deposits with 20-25 Pd at %, even when the Pd content of the alloys was as low as 1-2 at %. (Cu-Pd)+PdO composites were highly porous and mechanically stable. ©The Electrochemical Society.
2010
ECS Transactions
53
68
Electrodeposition of Cu+PdO and (Cu-Pd)+PdO composites / Verlato, Enrico*; Cattarin, Sandro; Comisso, Nicola; Gerbasi, Rosalba; Guerriero, Paolo; Musiani, Marco; Vázquez-Gómez, Lourdes. - In: ECS TRANSACTIONS. - ISSN 1938-5862. - ELETTRONICO. - 25:27(2010), pp. 53-68. (Intervento presentato al convegno Semiconductors, Metal Oxides, and Composites: Metallization and Electrodeposition of Thin Films and Nanostructures - 216th ECS Meeting tenutosi a Vienna, aut nel 2009) [10.1149/1.3318504].
Verlato, Enrico*; Cattarin, Sandro; Comisso, Nicola; Gerbasi, Rosalba; Guerriero, Paolo; Musiani, Marco; Vázquez-Gómez, Lourdes
File in questo prodotto:
Eventuali allegati, non sono esposti

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11585/648205
 Attenzione

Attenzione! I dati visualizzati non sono stati sottoposti a validazione da parte dell'ateneo

Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus 0
  • ???jsp.display-item.citation.isi??? 0
social impact