Oxidation of ferulic acid (C10H10O4) in aqueous medium occurs by using both commercial and home prepared TiO2 samples under visible light irradiation. Among the oxidation products vanillin was found with a selectivity ranging from 1 to 2% with respect to the converted substrate. By considering that TiO2 is unable to absorb visible light and ferulic acid does not react in the absence of TiO2, the observed photoactivity may be explained by the formation of a charge-transfer complex between ferulic acid and TiO2, being the complex able to absorb visible light. Among all the tested semiconductor oxides, only Merck anatase TiO2 does not perform the oxidation of ferulic acid under visible light irradiation while it is active under near-UV irradiation. Diffuse reflectance spectra of Merck samples impregnated with ferulic acid do not show any evidence of complex formation.
F. Parrino, V. Augugliaro, G. Camera Roda, V. Loddo, G. Palmisano, L. Palmisano, et al. (2012). Visible Light Induced Oxidation of Ferulic Acid by TiO2 Photocatalysis. Porto : Sociedade Portuguesa de Química.
Visible Light Induced Oxidation of Ferulic Acid by TiO2 Photocatalysis
CAMERA RODA, GIOVANNI;
2012
Abstract
Oxidation of ferulic acid (C10H10O4) in aqueous medium occurs by using both commercial and home prepared TiO2 samples under visible light irradiation. Among the oxidation products vanillin was found with a selectivity ranging from 1 to 2% with respect to the converted substrate. By considering that TiO2 is unable to absorb visible light and ferulic acid does not react in the absence of TiO2, the observed photoactivity may be explained by the formation of a charge-transfer complex between ferulic acid and TiO2, being the complex able to absorb visible light. Among all the tested semiconductor oxides, only Merck anatase TiO2 does not perform the oxidation of ferulic acid under visible light irradiation while it is active under near-UV irradiation. Diffuse reflectance spectra of Merck samples impregnated with ferulic acid do not show any evidence of complex formation.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
