WORKPAKAGE 2 (MODELLING) per UNIBO in un progetto europeo FP7-NMP-2008-SMALL-2: FP7 – NMP – 2008 – 2.1. – 2 Processing and upscaling of nano-structured materials Collaborative project Small or medium-scale focused research project - 36 months List of Participants Participant no. Participant organisation name Country 1 (Coordinator) Umicore Belgium 2 (S/T coordinator) Eidgenössische Materialprüfungs- und Forschungsanstalt (Empa) Switzerland 3 Alma Mater Studiorum - Universita’ di Bologna (UNIBO) Italy 4 Fraunhofer Institut für Werkstoff- und Strahltechnik (IWS) Germany 5 Dvorak Advanced Coating Solutions (DACS) Switzerland 6 SAFT S.A. France Scope Although nanotechnology, and particularly the development of nanoparticles-based materials, has advanced rapidly in recent years, industrial production techniques have not kept pace. At this point there is a substantial need for safe production facilities, enabling the synthesis of large amounts of metallic nanoparticles with controlled and uniform quality (particle size, particle size distribution, chemical composition, etc.). This project will respond to this need by developing an industrial production line including on-line monitoring systems, assuring at the same time a high quality of the synthesized product as well as safety for the operating personnel and surrounding environment. The nano-structured materials of interest for this project are silicon and silicon-based alloyed nanoparticles, which have a huge potential as anode material in battery applications. The production technology proposed is the Inductively Coupled Plasma (ICP) technique, which generates a high temperature thermal plasma discharge at atmospheric pressure. Since most of the ICP processes currently available are batch processes, the core of this project is the transfer of the ICP towards an industrial scale permitting the continuous production of a wide range of semiconductor or metallic (alloyed) nanoparticles. In order to achieve this, major scientific breakthroughs are required such as the incorporation of a novel on-line functionalisation technique, the design of an industrial powder injection system to ensure a continuous production, on-line monitoring techniques to ensure quality and safety and advanced modelling of the particle trajectories in the ICP plasma. A schematic representation of the scope of this project is illustrated in Figure 1. The resulting industrial production line will provide maximum production efficiency by virtue of fully automated and controlled feeding of raw materials and optimal reactor processing including evacuation of the processed powders. An additional advantage of this industrial line will be the recovery and recycling of excess precursor components and gases. Objectives The overall objective of this project is to transfer the ICP processing knowledge and technology investigated at a lab-scale (10-100 g/h) to an industrial scale apparatus for the continuous production of tailored oxygen-free Si-based nanopowders at a production rate between 1 and 10 kg/hour. The scientific objective with regard to the ICP processing is to synthesize nano-silicon based particles with an average particle size between 20 and 30 nm at a production rate of 1 to 10 kg/hour and a processing yield of at least 80%. The operational cost target at Umicore is 30€/kg. The technical objective in terms of electrochemical performance for the developed Si based powders is to reach 1500 mAh/g at the nano-alloy scale and an energy increase at cell level of 25% and 40% for respectively portable and industrial applications contributed with long cycle and storage life (> 300 cycles for portable application and > 1000 cycles for industrial application). The different quantitative project objectives are summarised in Table 1.
V. Colombo (2008). Scaling-up of ICP technology for continuous production of Metallic nanopowders for Battery Applications.
Scaling-up of ICP technology for continuous production of Metallic nanopowders for Battery Applications
COLOMBO, VITTORIO
2008
Abstract
WORKPAKAGE 2 (MODELLING) per UNIBO in un progetto europeo FP7-NMP-2008-SMALL-2: FP7 – NMP – 2008 – 2.1. – 2 Processing and upscaling of nano-structured materials Collaborative project Small or medium-scale focused research project - 36 months List of Participants Participant no. Participant organisation name Country 1 (Coordinator) Umicore Belgium 2 (S/T coordinator) Eidgenössische Materialprüfungs- und Forschungsanstalt (Empa) Switzerland 3 Alma Mater Studiorum - Universita’ di Bologna (UNIBO) Italy 4 Fraunhofer Institut für Werkstoff- und Strahltechnik (IWS) Germany 5 Dvorak Advanced Coating Solutions (DACS) Switzerland 6 SAFT S.A. France Scope Although nanotechnology, and particularly the development of nanoparticles-based materials, has advanced rapidly in recent years, industrial production techniques have not kept pace. At this point there is a substantial need for safe production facilities, enabling the synthesis of large amounts of metallic nanoparticles with controlled and uniform quality (particle size, particle size distribution, chemical composition, etc.). This project will respond to this need by developing an industrial production line including on-line monitoring systems, assuring at the same time a high quality of the synthesized product as well as safety for the operating personnel and surrounding environment. The nano-structured materials of interest for this project are silicon and silicon-based alloyed nanoparticles, which have a huge potential as anode material in battery applications. The production technology proposed is the Inductively Coupled Plasma (ICP) technique, which generates a high temperature thermal plasma discharge at atmospheric pressure. Since most of the ICP processes currently available are batch processes, the core of this project is the transfer of the ICP towards an industrial scale permitting the continuous production of a wide range of semiconductor or metallic (alloyed) nanoparticles. In order to achieve this, major scientific breakthroughs are required such as the incorporation of a novel on-line functionalisation technique, the design of an industrial powder injection system to ensure a continuous production, on-line monitoring techniques to ensure quality and safety and advanced modelling of the particle trajectories in the ICP plasma. A schematic representation of the scope of this project is illustrated in Figure 1. The resulting industrial production line will provide maximum production efficiency by virtue of fully automated and controlled feeding of raw materials and optimal reactor processing including evacuation of the processed powders. An additional advantage of this industrial line will be the recovery and recycling of excess precursor components and gases. Objectives The overall objective of this project is to transfer the ICP processing knowledge and technology investigated at a lab-scale (10-100 g/h) to an industrial scale apparatus for the continuous production of tailored oxygen-free Si-based nanopowders at a production rate between 1 and 10 kg/hour. The scientific objective with regard to the ICP processing is to synthesize nano-silicon based particles with an average particle size between 20 and 30 nm at a production rate of 1 to 10 kg/hour and a processing yield of at least 80%. The operational cost target at Umicore is 30€/kg. The technical objective in terms of electrochemical performance for the developed Si based powders is to reach 1500 mAh/g at the nano-alloy scale and an energy increase at cell level of 25% and 40% for respectively portable and industrial applications contributed with long cycle and storage life (> 300 cycles for portable application and > 1000 cycles for industrial application). The different quantitative project objectives are summarised in Table 1.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
