The fundamentals of material modification techniques to tailor charge transport properties of dielectric interfaces are reviewed and discussed, with distinguishing inbulk charge accumulation from free surface charging phenomena. It includes charge generation at the electrodes into polyethylene insulation and surface charging in gas environment as with epoxy / SF6 interface. Based on the understanding of advantages and drawbacks of these interface charge tailoring methods, the potential industrial application of these techniques is discussed. The results of this paper provide a reference and an orientation to the strategy regarding controlling of interface charge generation and transport in HVDC cables and gas insulated equipment. More importantly, it is hopefully that the interdisciplinary study of charge tailoring techniques in both solid/solid interface and gas/solid interface can inspire novel ideas for researchers into developing of suitable charge-free dielectrics used in HVDC equipment.
Advances in Interface Charge Tailoring Techniques: Fundamentals and Applications
Davide Fabiani;Chuanyang Li
2020
Abstract
The fundamentals of material modification techniques to tailor charge transport properties of dielectric interfaces are reviewed and discussed, with distinguishing inbulk charge accumulation from free surface charging phenomena. It includes charge generation at the electrodes into polyethylene insulation and surface charging in gas environment as with epoxy / SF6 interface. Based on the understanding of advantages and drawbacks of these interface charge tailoring methods, the potential industrial application of these techniques is discussed. The results of this paper provide a reference and an orientation to the strategy regarding controlling of interface charge generation and transport in HVDC cables and gas insulated equipment. More importantly, it is hopefully that the interdisciplinary study of charge tailoring techniques in both solid/solid interface and gas/solid interface can inspire novel ideas for researchers into developing of suitable charge-free dielectrics used in HVDC equipment.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.