Photonic Wire Bragg Gratings fabricated in Silicon-on-Insulator are obtained by periodic insertion of lateral recess into a photonic wire waveguide. Thanks to the high index contrast between silicon and air, they can potentially achieve large reflectivity within few tens of microns. To enable their practical use, taper stages are needed to enhance the coupling with the input and output photonic wires. In this paper, we verify that such gratings can be fabricated with controlled and reproducible dimensions and we demonstrate design curves that can be used for the fine tuning of taper elements.
Progetto di reticoli Photonic Wire / M. Gnan; M. Sorel; R. M. De La Rue; G. Bellanca; P. Bassi. - ELETTRONICO. - (2008). (Intervento presentato al convegno XVII Riunione Nazionale di Elettomagnetismo (XVII RiNEm) tenutosi a Lecce nel 15-18 settembre 2008).
Progetto di reticoli Photonic Wire
GNAN, MARCO;BASSI, PAOLO
2008
Abstract
Photonic Wire Bragg Gratings fabricated in Silicon-on-Insulator are obtained by periodic insertion of lateral recess into a photonic wire waveguide. Thanks to the high index contrast between silicon and air, they can potentially achieve large reflectivity within few tens of microns. To enable their practical use, taper stages are needed to enhance the coupling with the input and output photonic wires. In this paper, we verify that such gratings can be fabricated with controlled and reproducible dimensions and we demonstrate design curves that can be used for the fine tuning of taper elements.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
