The XAFS beamline at Elettra Synchrotron in Trieste combines X-ray absorption spectroscopy and X-ray diffraction to provide chemically specific structural information of materials. It operates in the energy range 2.4-27 keV by using a silicon double reflection Bragg monochromator. The fluorescence measurement is performed in place of the absorption spectroscopy when the sample transparency is too low for transmission measurements or the element to study is too diluted in the sample. We report on the development and on the preliminary tests of a new prototype detector based on Silicon Drift Detectors technology and the SIRIO ultra low noise front-end ASIC. The new system will be able to reduce drastically the time needed to perform fluorescence measurements, while keeping a short dead time and maintaining an adequate energy resolution to perform spectroscopy. The custom-made silicon sensor and the electronics are designed specifically for the beamline requirements.

Development and tests of a new prototype detector for the XAFS beamline at Elettra Synchrotron in Trieste

BALDAZZI, GIUSEPPE
Project Administration
;
RIGNANESE, LUIGI PIO
Investigation
;
SBRIZZI, ANTONIO
Investigation
;
2016

Abstract

The XAFS beamline at Elettra Synchrotron in Trieste combines X-ray absorption spectroscopy and X-ray diffraction to provide chemically specific structural information of materials. It operates in the energy range 2.4-27 keV by using a silicon double reflection Bragg monochromator. The fluorescence measurement is performed in place of the absorption spectroscopy when the sample transparency is too low for transmission measurements or the element to study is too diluted in the sample. We report on the development and on the preliminary tests of a new prototype detector based on Silicon Drift Detectors technology and the SIRIO ultra low noise front-end ASIC. The new system will be able to reduce drastically the time needed to perform fluorescence measurements, while keeping a short dead time and maintaining an adequate energy resolution to perform spectroscopy. The custom-made silicon sensor and the electronics are designed specifically for the beamline requirements.
2016
Fabiani, S.; Ahangarianabhari, M.; Baldazzi, Giuseppe; Bellutti, P.; Bertuccio, G.; Bruschi, M.; Bufon, J.; Carrato, S.; Castoldi, A.; Cautero, G.; Ciano, S.; Cicuttin, A.; Crespo, M. L.; Santos, M. Dos; Gandola, M.; Giacomini, G.; Giuressi, D.; Guazzoni, C.; Menk, R. H.; Niemela, J.; Olivi, L.; Picciotto, A.; Piemonte, C.; Rashevskaya, I.; Rachevski, A.; Rignanese, LUIGI PIO; Sbrizzi, Antonio; Schillani, S.; Vacchi, A.; Garcia, V. Villaverde; Zampa, G.; Zampa, N.; Zorzi, N.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11585/611759
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