A method for directly measuring the inverse screening length in semiconductors in terms of ionized-impurity concentration and lattice temperature is demonstrated, based on a first-principle calculation of the effect of ionized-impurity scattering. No fitting parameters are involved in the derivation, which covers a wide range of doping concentrations and intrinsically complies with the Mathiessen rule. A new class of integrals is introduced in the calculation. The results are compared with the standard derivation of the inverse screening length from the perturbative solution of the Poisson equation.

A Method for Determining the Screening Length of the Coulombic Scattering in Non-Degenerate and Degenerate Semiconductors / M. Rudan; G. Perroni. - STAMPA. - 1:(2004), pp. 121-124. (Intervento presentato al convegno International Conference on Simulation of Semiconductor Processes and Devices (SISPAD-2004) tenutosi a Munich nel 2-4 Settembre 2004).

A Method for Determining the Screening Length of the Coulombic Scattering in Non-Degenerate and Degenerate Semiconductors

RUDAN, MASSIMO;PERRONI, GIANCARLO
2004

Abstract

A method for directly measuring the inverse screening length in semiconductors in terms of ionized-impurity concentration and lattice temperature is demonstrated, based on a first-principle calculation of the effect of ionized-impurity scattering. No fitting parameters are involved in the derivation, which covers a wide range of doping concentrations and intrinsically complies with the Mathiessen rule. A new class of integrals is introduced in the calculation. The results are compared with the standard derivation of the inverse screening length from the perturbative solution of the Poisson equation.
2004
Simulation of Semiconductor Processes and Devices (SISPAD 2004)
121
124
A Method for Determining the Screening Length of the Coulombic Scattering in Non-Degenerate and Degenerate Semiconductors / M. Rudan; G. Perroni. - STAMPA. - 1:(2004), pp. 121-124. (Intervento presentato al convegno International Conference on Simulation of Semiconductor Processes and Devices (SISPAD-2004) tenutosi a Munich nel 2-4 Settembre 2004).
M. Rudan; G. Perroni
File in questo prodotto:
Eventuali allegati, non sono esposti

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11585/14112
 Attenzione

Attenzione! I dati visualizzati non sono stati sottoposti a validazione da parte dell'ateneo

Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus ND
  • ???jsp.display-item.citation.isi??? 0
social impact