RF-sputtering preparation of gold-nanoparticle-modified ITO electrodes for electrocatalytic applications

The preparation of gold-nanoparticle (AuNPs)-modified indium tin oxide (ITO) electrodes (AuNPs/ITO) was performed by radio-frequency (RF) sputtering from Ar plasmas at temperatures as low as 60 ◦C, tailoring the AuNP morphology and content as a function of the sole sputtering time. The latter parameter was varied from 5 to 20 min in order to investigate the influence of gold amount and distribution on the electrochemical performances of the resulting AuNPs/ITO systems. The electrodes were characterized using field emission-scanning electron microscopy (FE-SEM), UV–vis absorption and x-ray photoelectron spectroscopies (XPS); moreover variable scan rate cyclic voltammetry (CV) studies were performed to examine their electrochemical behavior. The electrocatalytic activity of the nanostructured AuNPs/ITO electrodes toward methanol oxidation was investigated and compared with a continuous gold film (Aufilm/ITO). The catalytic efficiency of the AuNPs/ITO systems was found to increase with the gold content and the AuNPs–support boundary region in the corresponding samples. For the longest sputtering time (i.e. 20 min) the performances of the nanostructured electrode were better than the Aufilm/ITO reference, despite the much lower catalyst amount. Furthermore, conversely from the AuNPs/ITO samples, in the Aufilm/ITO case the gold film displayed a poor adhesion to the substrate and the electrode could be used only for a limited number of electrochemical cycles.